| HS编码 | 商品名称 | 退税率 | 计量单位 | 海关监管 | 申报要素·检疫 | 编码对比 |
| 84861020.00 | 制造单晶柱或晶圆用的研磨设备
[Grinding machines for the manufacture of boules or wafers] |
13% | 台/千克 | 查看详情 | -- | |
| 84861030.00 | 制造单晶柱或晶圆用的切割设备
[Sawing machines for the manufacture of boules or wafers] |
13% | 台/千克 | 查看详情 | 对比-84861020.00 | |
| 84861040.00 | 制造单晶柱或晶圆用的化学机械抛光设备(CMP)
[Chemical mechanical polishers(CMP) for the manufacture of boules or wafers] |
13% | 台/千克 | 查看详情 | 对比-84861030.00 | |
| 84861090.00 | 其他制造单晶柱或晶圆用的机器及装置
[Other machines and apparatus for the manufacture of boules or wafers] |
13% | 台/千克 | 查看详情 | 对比-84861040.00 | |
| 84862010.00 | 氧化、扩散、退火及其他热处理设备
[Oxidation, diffusion, annealing and other heat treatment equipment for the manufacture of semiconductor devices or of electronic integrated circuis] |
13% | 台/千克 | 查看详情 | 对比-84861090.00 | |
| 84862021.00 | 制造半导体器件或集成电路用化学气相沉积装置
[Chemical Vapour Deposition(CVD)equipment for the manufacture of semiconductor devices or of electronic integrated circuis] |
13% | 台/千克 | 查看详情 | 对比-84862010.00 | |
| 84862022.00 | 制造半导体器件或集成电路用物理气相沉积装置
[Physical Vapour Deposition(PVD)equipment for the manufacture of semiconductor devices or of electronic integrated circuis] |
13% | 台/千克 | 查看详情 | 对比-84862021.00 | |
| 84862029.00 | 其他制造半导体器件或集成电路用薄膜沉积设备
[Other film deposition equipment for the manufacture of semiconductor devices or of electronic integrated circuis] |
13% | 台/千克 | 查看详情 | 对比-84862022.00 | |
| 84862031.10 | 制造半导体器件或集成电路用分布重复光刻机（后道用）
[Distributed repetitive lithography machine for manufacturing semiconductor devices or integrated circuits (for post-processing)] |
13% | 台/千克 | 查看详情 | 对比-84862029.00 | |
| 84862031.20 | 制造半导体器件或集成电路用分布重复光刻机（前道用 I 线光刻机）
[Distributed Repeat Lithography Machine for Manufacturing Semiconductor Devices or Integrated Circuits (I-line Lithography Machine for Front Processing)] |
13% | 台/千克 | 查看详情 | 对比-84862031.10 | |
| 84862031.30 | 制造半导体器件或集成电路用分布重复光刻机（前道用氟化氪（ KrF ）光刻机）
[Distributed repetitive lithography machine for manufacturing semiconductor devices or integrated circuits (KrF lithography machine for front-end)] |
13% | 台/千克 | 查看详情 | 对比-84862031.20 | |
| 84862031.90 | 其他制造半导体器件或集成电路用分布重复光刻机
[Distributed repetitive lithography machines for manufacturing other semiconductor devices or integrated circuits] |
13% | 台/千克 | 查看详情 | 对比-84862031.30 | |
| 84862039.10 | 制造半导体器件或集成电路用的 I 线光刻机（步进式除外）
[I-line lithography machine for manufacturing semiconductor devices or integrated circuits (excluding stepper type)] |
13% | 台/千克 | 查看详情 | 对比-84862031.90 | |
| 84862039.20 | 制造半导体器件或集成电路用的氟化氪（ KrF ）光刻机（步进式除外）
[Krypton fluoride (KrF) lithography machines used for manufacturing semiconductor devices or integrated circuits (excluding stepper)] |
13% | 台/千克 | 查看详情 | 对比-84862039.10 | |
| 84862039.30 | 制造半导体器件或集成电路用的氟化氩（ ArF ）光刻机（步进式除外）
[Argon fluoride (ArF) lithography machines for manufacturing semiconductor devices or integrated circuits (excluding stepper)] |
13% | 台/千克 | 查看详情 | 对比-84862039.20 | |
| 84862039.40 | 制造半导体器件或集成电路用的氟化氩浸没式（ ArFi ）光刻机（步进式除外）
[ArFi immersion lithography machines for manufacturing semiconductor devices or integrated circuits (excluding stepper lithography)] |
13% | 台/千克 | 查看详情 | 对比-84862039.30 | |
| 84862039.50 | 制造半导体器件或集成电路用的极紫外（ EUV ）光刻机（步进式除外）
[Extreme Ultraviolet (EUV) lithography machines for manufacturing semiconductor devices or integrated circuits (excluding stepper)] |
13% | 台/千克 | 查看详情 | 对比-84862039.40 | |
| 84862039.90 | 未列名制造半导体器件或集成电路用的光刻设备
[Lithography equipment for manufacturing semiconductor devices or integrated circuits not listed] |
13% | 台/千克 | 查看详情 | 对比-84862039.50 | |
| 84862041.00 | 制造半导体器件或集成电路用等离子体干法刻蚀机
[Dry plasma etching for the manufacture of semiconductor devices or of electronic integrated circuis] |
13% | 台/千克 | 查看详情 | 对比-84862039.90 | |
| 84862049.00 | 其他制造半导体器件或集成电路用刻蚀及剥离设备
[Other etching and stripping equipment for the manufacture of semiconductor devices or of electronic integrated circuis] |
13% | 台/千克 | 查看详情 | 对比-84862041.00 | |